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1

Photopolymer Materials and Processes for Advanced Technologies

Crivello, James V., Reichmanis, Elsa

Journal:

Chemistry of Materials

Année:

2014

Langue:

english

Fichier:

PDF, 1.80 MB

english, 2014

2

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Année:

1998

Langue:

english

Fichier:

PDF, 1.37 MB

english, 1998

3

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || Correlation of the Strength of Photogenerated Acid with the Post-Exposure Delay Effect in Positive-Tone Chemically Amplified Deep-UV Resists

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Année:

1995

Langue:

english

Fichier:

PDF, 2.72 MB

english, 1995

4

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Excimer Laser Exposure Characteristics Of Inorganic Resists Based On Peroxo-Polytungstic Acids

Ishikawa, Akira, Okamoto, Hiroshi, Miyauchi, Katsuki, Kudo, Tetsuichi, Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 6.46 MB

english, 1989

5

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - X-ray Chemical Reactions of Novolac Diazonaphthoquinone Resists

Mancini, Derrick C., Sullivan, Monroe, Taylor, James W., Bormett, Richard, Jayaraman, T. V., West, Richard J., Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 565 KB

english, 1989

6

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Development of a chemically amplified positive resist material for single-layer deep-UV lithography

Nalamasu, Omkaram, Cheng, May, Kometani, Janet M., Vaidya, Sheila, Reichmanis, Elsa, Thompson, Larry F., Watts, Michael P. C.

Année:

1990

Langue:

english

Fichier:

PDF, 1.06 MB

english, 1990

7

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Preliminary lithographic characteristics of an all-organic chemically amplified resist formulation for single-layer deep-UV lithography

Nalamasu, Omkaram, Reichmanis, Elsa, Cheng, May, Pol, Victor, Kometani, Janet M., Houlihan, Francis M., Neenan, Thomas X., Bohrer, M. P., Mixon, David A., Thompson, Larry F., Takemoto, Clifford H., It

Année:

1991

Langue:

english

Fichier:

PDF, 1.18 MB

english, 1991

8

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - An I-Line Image Reversal Process For Submicron Lithography

Chu, Ron, Singh, Bhanwar, Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 13.77 MB

english, 1989

9

SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Advances in Resist Technology and Processing III - Synthesis And Lithographic Characterization Of A Novel Organosilicon Novolac Resin

Tarascon, Regine G., Shugard, Ann, Reichmanis, Elsa, Willson, C. Grant

Année:

1986

Langue:

english

Fichier:

PDF, 4.41 MB

english, 1986

10

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - The Effect Of Sensitizer Chemistry On Decarboxylation-Type Image Reversal Systems

Grunwald, John J., Gal, Chava, Aronhime, Marc T., Eidelman, Sigalit, Johnson, Donald W., Shalom, Eitan, Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 7.64 MB

english, 1989

11

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Année:

1998

Langue:

english

Fichier:

PDF, 1.15 MB

english, 1998

12

Polymer materials for microlithography

Reichmanis, Elsa, Thompson, Larry F.

Journal:

Chemical Reviews

Année:

1989

Langue:

english

Fichier:

PDF, 4.46 MB

english, 1989

13

Electrical Contact Properties between the Accumulation Layer and Metal Electrodes in Ultrathin Poly(3-hexylthiophene)(P3HT) Field Effect Transistors

Park, Byoungnam, Aiyar, Avishek, Hong, Jung-il, Reichmanis, Elsa

Journal:

ACS Applied Materials & Interfaces

Année:

2011

Langue:

english

Fichier:

PDF, 2.52 MB

english, 2011

14

Organic Materials Challenges for 193 nm Imaging

Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Frank M.

Journal:

Accounts of Chemical Research

Année:

1999

Langue:

english

Fichier:

PDF, 227 KB

english, 1999

15

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Post-Exposure Bake Kinetics in Epoxy Novolac-Based Chemically Amplified Resists

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Année:

1998

Langue:

english

Fichier:

PDF, 940 KB

english, 1998

16

Challenges in Lithographic Materials and Processes

Reichmanis, Elsa, Thompson, Larry F.

Journal:

AT&T Technical Journal

Année:

1990

Langue:

english

Fichier:

PDF, 7.46 MB

english, 1990

17

Anisotropic Assembly of Conjugated Polymer Nanocrystallites for Enhanced Charge Transport

Chang, Mincheol, Lee, Jiho, Chu, Ping-Hsun, Choi, Dalsu, Park, Byoungnam, Reichmanis, Elsa

Journal:

ACS Applied Materials & Interfaces

Année:

2014

Langue:

english

Fichier:

PDF, 8.07 MB

english, 2014

18

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Chemically Amplified Resists: A Lithographic Comparison of Acid Generating Species.

Neenan, T. X., Houlihan, F. M., Reichmanis, E., Kometani, J. M., Bachman, B. J., Thompson, L. F., Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 1.77 MB

english, 1989

19

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Calixarene and Dendrimer as Novel Photoresist Materials

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Année:

1998

Langue:

english

Fichier:

PDF, 878 KB

english, 1998

20

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || Photoacid and Photobase Generators: Arylmethyl Sulfones and Benzhydrylammonium Salts

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Année:

1995

Langue:

english

Fichier:

PDF, 1.69 MB

english, 1995

21

Photopolymerization of Surface Coatingsby C. G. Roffey

Review by: Elsa Reichmanis

Journal:

American Scientist

Année:

1984

Langue:

english

Fichier:

PDF, 336 KB

english, 1984

22

[ACS Symposium Series] The Effects of Radiation on High-Technology Polymers Volume 381 || Radiation Durability of Polymeric Matrix Composites

Reichmanis, Elsa, O'Donnell, James H.

Année:

1989

Langue:

english

Fichier:

PDF, 1.93 MB

english, 1989

23

Lithographic Materials Technologies: 193 nm Imaging and Beyond

Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Francis M., Gabor, Allen H., Neisser, Mark O., Bowden, Murrae J.

Journal:

MRS Proceedings

Année:

1999

Langue:

english

Fichier:

PDF, 871 KB

english, 1999

24

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - A Chemical Reaction And Influence Of Deep-UV Light Wavelength On REL (Resolution Enhanced Lithography)

Fukumoto, H., Okuda, Y., Takashima, Y., Ohkuma, T., Ueda, S., Inoue, M., Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 3.67 MB

english, 1989

25

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || Following the Acid: Effect of Acid Surface Depletion on Phenolic Polymers

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Année:

1995

Langue:

english

Fichier:

PDF, 1.84 MB

english, 1995

26

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Novolak Based Thermally Resistant Positive Photoresist: Resin Design and Performance

Zampini, A., Fischer, R. L., Wickman, J. B., Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 13.67 MB

english, 1989

27

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Deep UV ANR Photoresists For 248 nm Excimer Laser Photolithography

Thackeray, James W., Orsula, George W., Pavelchek, Edward K., Canistro, Dianne, Bogan, Jr., Leonard E., Berry, Amanda K., Graziano, Karen A., Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 16.45 MB

english, 1989

28

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - On The Molecular Mechanism Of Positive Novolac Resists

Huang, Jian-Ping, Kwei, T. K., Reiser, Arnost, Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 1.11 MB

english, 1989

29

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Positive-Working Polyimide Resists Based On Diazonaphthoquinone Photochemistry

Moss, Mary G., Cuzmar, Ruth M., Brewer, Terry, Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 3.10 MB

english, 1989

30

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Dry Developable Plasma Polymerized Photo-Resist System For Curved Surface Fabrication

Yamada, Hitomi, Nakamura, Makoto, Morita, Shinzo, Hattori, Shuzo, Ishikawa, Norio, Miyazaki, Masao, Katsuragi, Hayato, Mori, Kiyoto, Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 2.84 MB

english, 1989

31

[ACS Symposium Series] Irradiation of Polymeric Materials Volume 527 (Processes, Mechanisms, and Applications) || Diazonaphthoquinone—Novolac Resist Dissolution in Composite Langmuir—Blodgett and Spin-Cast Films

Reichmanis, Elsa, Frank, Curtis W., O'Donnell, James H.

Année:

1993

Langue:

english

Fichier:

PDF, 2.13 MB

english, 1993

32

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || Application of Polyisoimide as a Polyimide Precursor to Polymer Adhesives and Photosensitive Polymers

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Année:

1995

Langue:

english

Fichier:

PDF, 1.32 MB

english, 1995

33

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Improved Thermal Stability Of High Resolution Positive Photoresists Via Elevated Softbake Temperatures

Aronhime, Marc T., Gal, Chava, Silady, Shoshana, Grunwald, John J., Johnson, Donald W., Martin, Jr., Theodore A., Spencer, Allen C., Sawoska, David A., Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 805 KB

english, 1989

34

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - A Novel Photooxidative Scheme for Imaging at Polymer Surfaces

Nalamasu, Omkaram, Taylor, Gary N., Reichmanis, Elsa

Année:

1989

Langue:

english

Fichier:

PDF, 15.58 MB

english, 1989

35

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || Hydrogen Bonding in Sulfone- and N -Methylmaleimide-Containing Resist Polymers with Hydroxystyrene and Acetoxystyrene

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Année:

1995

Langue:

english

Fichier:

PDF, 1.74 MB

english, 1995

36

Electron/Ion Transport Enhancer in High Capacity Li-Ion Battery Anodes

Kwon, Yo Han, Minnici, Krysten, Huie, Matthew M., Takeuchi, Kenneth J., Takeuchi, Esther S., Marschilok, Amy C., Reichmanis, Elsa

Journal:

Chemistry of Materials

Année:

2016

Langue:

english

Fichier:

PDF, 1.39 MB

english, 2016

37

An overview of resist processing for deep-UV lithography.

NALAMASU, OMKARAM, CHENG, MAY, TIMKO, ALLEN G., POL, VICTOR, REICHMANIS, ELSA, THOMPSON, LARRY F.

Journal:

Journal of Photopolymer Science and Technology

Année:

1991

Langue:

english

Fichier:

PDF, 830 KB

english, 1991

38

Wetting of Inkjet Polymer Droplets on Porous Alumina Substrates

Zhou, Haihua, Chang, Rui, Reichmanis, Elsa, Song, Yanlin

Journal:

Année:

2017

Langue:

english

Fichier:

PDF, 1.36 MB

english, 2017

39

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || Water-Soluble Onium Salts: New Class of Acid Generators for Chemical Amplification Positive Resists

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Année:

1995

Langue:

english

Fichier:

PDF, 1.66 MB

english, 1995

40

[ACS Symposium Series] Polymers in Microlithography Volume 412 (Materials and Processes) || New Design for Self-Developing Imaging Systems Based on Thermally Labile Polyformals

Reichmanis, Elsa, MacDonald, Scott A., Iwayanagi, Takao

Année:

1989

Langue:

english

Fichier:

PDF, 1.05 MB

english, 1989

41

[ACS Symposium Series] Polymers in Microlithography Volume 412 (Materials and Processes) || Pyrimidine Derivatives as Lithographic Materials

Reichmanis, Elsa, MacDonald, Scott A., Iwayanagi, Takao

Année:

1989

Langue:

english

Fichier:

PDF, 1.24 MB

english, 1989

42

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Alkali-Developable Positive-Photosensitive Polyimide Based on Diazonaphthoquinone Sensitizer

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Année:

1998

Langue:

english

Fichier:

PDF, 709 KB

english, 1998

43

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || NMR Investigation of Miscibility in Novolac—Poly(2-methyl-1-pentene sulfone) Resists

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Année:

1995

Langue:

english

Fichier:

PDF, 1.50 MB

english, 1995

44

Control of Molecular Ordering, Alignment, and Charge Transport in Solution-Processed Conjugated Polymer Thin Films

Chang, Mincheol, Lim, Gyun, Park, Byoungnam, Reichmanis, Elsa

Journal:

Année:

2017

Langue:

english

Fichier:

PDF, 8.38 MB

english, 2017

45

[ACS Symposium Series] Microelectronics Technology Volume 614 (Polymers for Advanced Imaging and Packaging) || An Analysis of Process Issues with Chemically Amplified Positive Resists

Reichmanis, Elsa, Ober, Christopher K., MacDonald, Scott A., Iwayanagi, Takao, Nishikubo, Tadatomi

Année:

1995

Langue:

english

Fichier:

PDF, 2.44 MB

english, 1995

46

Perovskite solar cells with a hybrid electrode structure

Hu, Yinghong, Adhyaksa, Gede W. P., DeLuca, Giovanni, Simonov, Alexandr N., Duffy, Noel W., Reichmanis, Elsa, Bach, Udo, Docampo, Pablo, Bein, Thomas, Garnett, Erik C., Chesman, Anthony S. R., Jumabek

Journal:

Année:

2019

Langue:

english

Fichier:

PDF, 2.49 MB

english, 2019

47

Ring Patterned Perovskite Single Crystals Fabricated by the Combination of Rigid and Flexible Templates

Zhou, Haihua, Liu, Weicai, Chang, Rui, Huang, Zhandong, Sha, Xuzheng, Chen, Guozhu, Reichmanis, Elsa, Song, Yanlin

Journal:

ACS Applied Materials & Interfaces

Année:

2020

Fichier:

PDF, 1.08 MB

2020

48

Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography

Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Francis M, Novembre, Anthony E

Journal:

Polymer International

Année:

1999

Langue:

english

Fichier:

PDF, 364 KB

english, 1999

49

Tunable Crystallinity in Regioregular Poly(3-Hexylthiophene) Thin Films and Its Impact on Field Effect Mobility

Avishek R. Aiyar, Jung-Il Hong, Rakesh Nambiar, David M. Collard, Elsa Reichmanis

Journal:

Advanced Functional Materials

Année:

2011

Langue:

english

Fichier:

PDF, 947 KB

english, 2011

50

Plastic electronic devices: From materials design to device applications

Elsa Reichmanis, Howard Katz, Christian Kloc, Ashok Maliakal

Journal:

Bell Labs Technical Journal

Année:

2005

Langue:

english

Fichier:

PDF, 199 KB

english, 2005